Bulk-disclination correspondence in topological crystalline insulators.

Liu, Yang; Leung, Shuwai; Li, Fei-Fei; Lin, Zhi-Kang; Tao, Xiufeng; Poo, Yin; Jiang, Jian-Hua.

Afiliação

Liu Y; School of Physical Science and Technology, and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, China.
Leung S; School of Electronic Science and Engineering, Nanjing University, Nanjing, China.
Li FF; School of Electronic Science and Engineering, Nanjing University, Nanjing, China.
Lin ZK; School of Physical Science and Technology, and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, China.
Tao X; School of Electronic Science and Engineering, Nanjing University, Nanjing, China.
Poo Y; School of Electronic Science and Engineering, Nanjing University, Nanjing, China. ypoo@nju.edu.cn.
Jiang JH; School of Physical Science and Technology, and Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, China. jianhuajiang@suda.edu.cn.

Nature ; 589(7842): 381-385, 2021 01.

Article em En | MEDLINE | ID: mdl-33473227

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article