Halogen Etch of Ti<sub>3</sub>AlC<sub>2</sub> MAX Phase for MXene Fabrication.

Halogen Etch of Ti₃AlC₂ MAX Phase for MXene Fabrication.

Jawaid, Ali; Hassan, Asra; Neher, Gregory; Nepal, Dhriti; Pachter, Ruth; Kennedy, W Joshua; Ramakrishnan, Subramanian; Vaia, Richard A.

Afiliação

Jawaid A; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433-7702, United States.
Hassan A; UES Inc., Beavercreek, Ohio 45432, United States.
Neher G; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433-7702, United States.
Nepal D; Department of Chemical and Biomedical Engineering, FAMU-FSU College of Engineering, Tallahassee, Florida 32310, United States.
Pachter R; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433-7702, United States.
Kennedy WJ; Universal Technology Corporation, Beavercreek, Ohio 45432, United States.
Ramakrishnan S; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433-7702, United States.
Vaia RA; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson AFB, Ohio 45433-7702, United States.

ACS Nano ; 15(2): 2771-2777, 2021 Feb 23.

Article em En | MEDLINE | ID: mdl-33502839