Photoindentation: A New Route to Understanding Dislocation Behavior in Light.

Nakamura, Atsutomo; Fang, Xufei; Matsubara, Ayaka; Tochigi, Eita; Oshima, Yu; Saito, Tatsushi; Yokoi, Tatsuya; Ikuhara, Yuichi; Matsunaga, Katsuyuki.

Afiliação

Nakamura A; Department of Materials Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Fang X; PRESTO, Japan Science and Technology Agency (JST), 7, Gobancho, Chiyoda-ku, Tokyo 102-0076, Japan.
Matsubara A; Department of Materials and Earth Sciences, Technical University of Darmstadt, 64287 Darmstadt, Germany.
Tochigi E; Department of Materials Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Oshima Y; PRESTO, Japan Science and Technology Agency (JST), 7, Gobancho, Chiyoda-ku, Tokyo 102-0076, Japan.
Saito T; Institute of Engineering Innovation, The University of Tokyo, 2-11-16 Yayoi, Bunkyo-ku, Tokyo 113-8656, Japan.
Yokoi T; Department of Materials Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Ikuhara Y; Department of Materials Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.
Matsunaga K; Department of Materials Physics, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan.