Conformal Growth of Nanometer-Thick Transition Metal Dichalcogenide TiS x -NbS x Heterostructures over 3D Substrates by Atomic Layer Deposition: Implications for Device Fabrication.

Basuvalingam, Saravana Balaji; Bloodgood, Matthew A; Verheijen, Marcel A; Kessels, Wilhelmus M M; Bol, Ageeth A

Conformal Growth of Nanometer-Thick Transition Metal Dichalcogenide TiS _x -NbS _x Heterostructures over 3D Substrates by Atomic Layer Deposition: Implications for Device Fabrication.

Basuvalingam, Saravana Balaji; Bloodgood, Matthew A; Verheijen, Marcel A; Kessels, Wilhelmus M M; Bol, Ageeth A.

Afiliação

Basuvalingam SB; Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, Eindhoven 5600 MB, The Netherlands.
Bloodgood MA; Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, Eindhoven 5600 MB, The Netherlands.
Verheijen MA; Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, Eindhoven 5600 MB, The Netherlands.
Kessels WMM; Eurofins Materials Science, High Tech Campus 11, Eindhoven 5656 AE, The Netherlands.
Bol AA; Department of Applied Physics, Eindhoven University of Technology, P. O. Box 513, Eindhoven 5600 MB, The Netherlands.

ACS Appl Nano Mater ; 4(1): 514-521, 2021 Jan 22.

Article em En | MEDLINE | ID: mdl-33615158

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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article