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Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption.
Jeong, Ji-Young; Lee, Je-Ryung; Park, Hyeonjin; Jung, Joonkyo; Choi, Doo-Sun; Jeon, Eun-Chae; Shin, Jonghwa; Han, Jun Sae; Je, Tae-Jin.
Afiliação
  • Jeong JY; Department of Nano Mechatronics Engineering, University of Science and Technology (UST), Daejeon, 34113, Republic of Korea.
  • Lee JR; Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 34103, Republic of Korea.
  • Park H; Advanced Cutting Tools Research Team, Daegu Mechatronics and Materials Institute (DMI), Daegu, 42714, Republic of Korea.
  • Jung J; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea.
  • Choi DS; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea.
  • Jeon EC; Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM), Daejeon, 34103, Republic of Korea.
  • Shin J; School of Materials Science and Engineering, University of Ulsan, Ulsan, 44610, Republic of Korea.
  • Han JS; Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon, 34141, Republic of Korea.
  • Je TJ; Department of Nano Mechatronics Engineering, University of Science and Technology (UST), Daejeon, 34113, Republic of Korea. jshan@kimm.re.kr.
Sci Rep ; 11(1): 12767, 2021 Jun 17.
Article em En | MEDLINE | ID: mdl-34140536
ABSTRACT
Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than - 10 dB in the frequency band range of 8.0-14.6 GHz.

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article