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Vapor Phase Synthesis of SnS Facilitated by Ligand-Driven "Launch Vehicle" Effect in Tin Precursors.
Atamtürk, Ufuk; Brune, Veronika; Mishra, Shashank; Mathur, Sanjay.
Afiliação
  • Atamtürk U; Institute of Inorganic Chemistry, University of Cologne, Greinstraße 6, 50939 Cologne, Germany.
  • Brune V; Institute of Inorganic Chemistry, University of Cologne, Greinstraße 6, 50939 Cologne, Germany.
  • Mishra S; Institut de Recherches sur la Catalyse et l'Environnement de Lyon (IRCELYON), Université Claude Bernard Lyon 1, CNRS, UMR 5256, 2 Avenue Albert Einstein, 69626 Villeurbanne, France.
  • Mathur S; Institute of Inorganic Chemistry, University of Cologne, Greinstraße 6, 50939 Cologne, Germany.
Molecules ; 26(17)2021 Sep 03.
Article em En | MEDLINE | ID: mdl-34500799
Extraordinary low-temperature vapor-phase synthesis of SnS thin films from single molecular precursors is attractive over conventional high-temperature solid-state methods. Molecular-level processing of functional materials is accompanied by several intrinsic advantages such as precise control over stoichiometry, phase selective synthesis, and uniform substrate coverage. We report here on the synthesis of a new heteroleptic molecular precursor containing (i) a thiolate ligand forming a direct Sn-S bond, and (ii) a chelating O^N^N-donor ligand introducing a "launch vehicle"-effect into the synthesized compound, thus remarkably increasing its volatility. The newly synthesized tin compound [Sn(SBut)(tfb-dmeda)] 1 was characterized by single-crystal X-ray diffraction analysis that verified the desired Sn:S ratio in the molecule, which was demonstrated in the direct conversion of the molecular complex into SnS thin films. The multi-nuclei (1H, 13C, 19F, and 119Sn) and variable-temperature 1D and 2D NMR studies indicate retention of the overall solid-state structure of 1 in the solution and suggest the presence of a dynamic conformational equilibrium. The fragmentation behavior of 1 was analyzed by mass spectrometry and compared with those of homoleptic tin tertiary butyl thiolates [Sn(SBut)2] and [Sn(SBut)4]. The precursor 1 was then used to deposit SnS thin films on different substrates (FTO, Mo-coated soda-lime glass) by CVD and film growth rates at different temperatures (300-450 °C) and times (15-60 min), film thickness, crystalline quality, and surface morphology were investigated.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article