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Rapid Prototyping of Organ-on-a-Chip Devices Using Maskless Photolithography.
Kasi, Dhanesh G; de Graaf, Mees N S; Motreuil-Ragot, Paul A; Frimat, Jean-Phillipe M S; Ferrari, Michel D; Sarro, Pasqualina M; Mastrangeli, Massimo; van den Maagdenberg, Arn M J M; Mummery, Christine L; Orlova, Valeria V.
Afiliação
  • Kasi DG; Department of Anatomy and Embryology, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • de Graaf MNS; Department of Human Genetics, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • Motreuil-Ragot PA; Department of Neurology, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • Frimat JMS; Department of Anatomy and Embryology, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • Ferrari MD; Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands.
  • Sarro PM; Department of Human Genetics, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • Mastrangeli M; Department of Neurology, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • van den Maagdenberg AMJM; Department of Neurology, Leiden University Medical Center, 2333 ZA Leiden, The Netherlands.
  • Mummery CL; Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands.
  • Orlova VV; Department of Microelectronics, Delft University of Technology, 2628 CD Delft, The Netherlands.
Micromachines (Basel) ; 13(1)2021 Dec 29.
Article em En | MEDLINE | ID: mdl-35056214
ABSTRACT
Organ-on-a-chip (OoC) and microfluidic devices are conventionally produced using microfabrication procedures that require cleanrooms, silicon wafers, and photomasks. The prototyping stage often requires multiple iterations of design steps. A simplified prototyping process could therefore offer major advantages. Here, we describe a rapid and cleanroom-free microfabrication method using maskless photolithography. The approach utilizes a commercial digital micromirror device (DMD)-based setup using 375 nm UV light for backside exposure of an epoxy-based negative photoresist (SU-8) on glass coverslips. We show that microstructures of various geometries and dimensions, microgrooves, and microchannels of different heights can be fabricated. New SU-8 molds and soft lithography-based polydimethylsiloxane (PDMS) chips can thus be produced within hours. We further show that backside UV exposure and grayscale photolithography allow structures of different heights or structures with height gradients to be developed using a single-step fabrication process. Using this

approach:

(1) digital photomasks can be designed, projected, and quickly adjusted if needed; and (2) SU-8 molds can be fabricated without cleanroom availability, which in turn (3) reduces microfabrication time and costs and (4) expedites prototyping of new OoC devices.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article