N-Heterocyclic Carbene Based Nanolayer for Copper Film Oxidation Mitigation.

Berg, Iris; Amit, Einav; Hale, Lillian; Toste, F Dean; Gross, Elad.

Afiliação

Berg I; Institute of Chemistry and the Center for Nanoscience and Nanotechnology, The Hebrew University, Jerusalem, 91904, Israel.
Amit E; Institute of Chemistry and the Center for Nanoscience and Nanotechnology, The Hebrew University, Jerusalem, 91904, Israel.
Hale L; Department of Chemistry, University of California, Berkeley, CA 94720, USA.
Toste FD; Department of Chemistry, University of California, Berkeley, CA 94720, USA.
Gross E; Institute of Chemistry and the Center for Nanoscience and Nanotechnology, The Hebrew University, Jerusalem, 91904, Israel.

Angew Chem Int Ed Engl ; 61(25): e202201093, 2022 Jun 20.

Article em En | MEDLINE | ID: mdl-35315187