Role of processing parameters in CVD grown crystalline monolayer MoSe<sub>2</sub>.

Role of processing parameters in CVD grown crystalline monolayer MoSe₂.

Papanai, Girija Shankar; Sahoo, Krishna Rani; Reshma G, Betsy; Gupta, Sarika; Gupta, Bipin Kumar.

Afiliação

Papanai GS; Photonic Materials Metrology Sub Division, Advanced Materials and Device Metrology Division, CSIR-National Physical Laboratory Dr K. S. Krishnan Marg New Delhi 110012 India bipinbhu@yahoo.com.
Sahoo KR; Academy of Scientific and Innovative Research (AcSIR) Ghaziabad 201002 India.
Reshma G B; Tata Institute of Fundamental Research - Hyderabad Sy. No. 36/P Serilingampally, Mandal, Gopanpally Village Hyderabad 500046 India.
Gupta S; Academy of Scientific and Innovative Research (AcSIR) Ghaziabad 201002 India.
Gupta BK; CSIR-Institute of Genomics and Integrative Biology Mathura Road New Delhi 110025 India.

RSC Adv ; 12(21): 13428-13439, 2022 Apr 28.

Article em En | MEDLINE | ID: mdl-35520140

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article