Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist.

Shi, Jingwei; Ravi, Ajay; Richey, Nathaniel E; Gong, Huaxin; Bent, Stacey F.

Afiliação

Shi J; Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States.
Ravi A; Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States.
Richey NE; Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States.
Gong H; Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States.
Bent SF; Department of Chemical Engineering, Stanford University, Stanford, California 94305, United States.

ACS Appl Mater Interfaces ; 2022 Jun 02.

Article em En | MEDLINE | ID: mdl-35653232