Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO<sub>2</sub> Ferroelectric Capacitor.

Impact of Chamber/Annealing Temperature on the Endurance Characteristic of Zr:HfO₂ Ferroelectric Capacitor.

Choi, Yejoo; Han, Changwoo; Shin, Jaemin; Moon, Seungjun; Min, Jinhong; Park, Hyeonjung; Eom, Deokjoon; Lee, Jehoon; Shin, Changhwan.

Afiliação

Choi Y; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Korea.
Han C; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Korea.
Shin J; Department of Electrical Engineering, University of Notre Dame, Notre Dame, IN 46556, USA.
Moon S; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Korea.
Min J; Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI 48109, USA.
Park H; Department of Electrical and Computer Engineering, Sungkyunkwan University, Suwon 16419, Korea.
Eom D; School of Advanced Materials Sciences and Engineering, Sungkyunkwan University, Suwon 16419, Korea.
Lee J; School of Advanced Materials Sciences and Engineering, Sungkyunkwan University, Suwon 16419, Korea.
Shin C; School of Electrical Engineering, Korea University, Seoul 02841, Korea.