All-Printed Ultrahigh-Responsivity MoS<sub>2</sub> Nanosheet Photodetectors Enabled by Megasonic Exfoliation.

Kuo, Lidia; Sangwan, Vinod K; Rangnekar, Sonal V; Chu, Ting-Ching; Lam, David; Zhu, Zhehao; Richter, Lee J; Li, Ruipeng; Szydlowska, Beata M; Downing, Julia R; Luijten, Benjamin J; Lauhon, Lincoln J; Hersam, Mark C

All-Printed Ultrahigh-Responsivity MoS₂ Nanosheet Photodetectors Enabled by Megasonic Exfoliation.

Kuo, Lidia; Sangwan, Vinod K; Rangnekar, Sonal V; Chu, Ting-Ching; Lam, David; Zhu, Zhehao; Richter, Lee J; Li, Ruipeng; Szydlowska, Beata M; Downing, Julia R; Luijten, Benjamin J; Lauhon, Lincoln J; Hersam, Mark C.

Afiliação

Kuo L; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Sangwan VK; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Rangnekar SV; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Chu TC; Applied Physics Graduate Program, Northwestern University, Evanston, IL, 60208, USA.
Lam D; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Zhu Z; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Richter LJ; National Institute of Standards and Technology, Gaithersburg, MD, 20899, USA.
Li R; National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY, 11973, USA.
Szydlowska BM; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Downing JR; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Luijten BJ; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Lauhon LJ; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.
Hersam MC; Department of Materials Science and Engineering, Northwestern University, Evanston, IL, 60208, USA.