Hole Concentration Reduction in CuI by Zn Substitution and its Mechanism: Toward Device Applications.

Tsuji, Masatake; Iimura, Soshi; Kim, Junghwan; Hosono, Hideo.

Afiliação

Tsuji M; Materials Research Center for Element Strategy (MCES), Tokyo Institute of Technology, Yokohama 226-8503, Japan.
Iimura S; Materials Research Center for Element Strategy (MCES), Tokyo Institute of Technology, Yokohama 226-8503, Japan.
Kim J; National Institute for Materials Science (NIMS), Tsukuba, Ibaraki 305-0044, Japan.
Hosono H; Precursory Research for Embryonic Science and Technology (PRESTO), Kawaguchi, Saitama 332-0012, Japan.

ACS Appl Mater Interfaces ; 2022 Jul 13.

Article em En | MEDLINE | ID: mdl-35830329