Controlling the Balance between Remote, Pinhole, and van der Waals Epitaxy of Heusler Films on Graphene/Sapphire.

Du, Dongxue; Jung, Taehwan; Manzo, Sebastian; LaDuca, Zachary; Zheng, Xiaoqi; Su, Katherine; Saraswat, Vivek; McChesney, Jessica; Arnold, Michael S; Kawasaki, Jason Ken

Du, Dongxue; Jung, Taehwan; Manzo, Sebastian; LaDuca, Zachary; Zheng, Xiaoqi; Su, Katherine; Saraswat, Vivek; McChesney, Jessica; Arnold, Michael S; Kawasaki, Jason Ken.

Afiliação

Du D; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
Jung T; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
Manzo S; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
LaDuca Z; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
Zheng X; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
Su K; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
Saraswat V; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
McChesney J; Advanced Photon Source, Argonne National Laboratory, Lemont, Illinois60439, United States of America.
Arnold MS; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.
Kawasaki JK; Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin53706, United States of America.