In situx-ray photoelectron spectroscopy analysis of the atomic layer deposition of Al2O3on SiOx/Si: Interface dipole and persistent surface groups.

Li, Jinxiong; Zhao, Ran; Wang, Xinwei

In situx-ray photoelectron spectroscopy analysis of the atomic layer deposition of Al₂O₃on SiO_x/Si: Interface dipole and persistent surface groups.

Li, Jinxiong; Zhao, Ran; Wang, Xinwei.

Afiliação

Li J; School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, People's Republic of China.
Zhao R; School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, People's Republic of China.
Wang X; School of Advanced Materials, Shenzhen Graduate School, Peking University, Shenzhen 518055, People's Republic of China.

Nanotechnology ; 34(24)2023 Mar 30.

Article em En | MEDLINE | ID: mdl-36917851