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Examining the Molecular Origins of Anomalously High H2O Generation at Oxide-Passivated Metal Surfaces for Plasma Applications.
Leung, Kevin; Goeke, Ronald S; Ilgen, Anastasia G; Wilson, Alexander; Cuneo, Micheal E; Bennett, Nichelle Lee.
Afiliação
  • Leung K; ORG 1131, Sandia National Laboratories, Physical, Chemical, and Nano Sciences Center, MS 1415, PO Box 5800, Albuquerque, NM 87185-1415, USA, Albuquerque, New Mexico, 87185, UNITED STATES.
  • Goeke RS; Sandia National Laboratories, MS 0871, Albuquerque, New Mexico, 87185, UNITED STATES.
  • Ilgen AG; Sandia National Laboratories, MS 0754, Albuquerque, New Mexico, 87185-5820, UNITED STATES.
  • Wilson A; Keyence Corporation of America, NA, Los Angeles, 90001, UNITED STATES.
  • Cuneo ME; Org. 01650, Sandia National Laboratories, MS1195, Albuquerque, NM 87185-1193, Albuquerque, 87185, UNITED STATES.
  • Bennett NL; Sandia National Laboratories, MS1186, Albuquerque, New Mexico, 87185-5820, UNITED STATES.
J Phys Condens Matter ; 2023 Jul 21.
Article em En | MEDLINE | ID: mdl-37478869
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Texto completo: 1 Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2023 Tipo de documento: Article
Texto completo
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XML
PubMed Links
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Texto completo: 1 Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2023 Tipo de documento: Article