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Tunable defect engineering of Mo/TiON electrode in angstrom-laminated HfO2/ZrO2ferroelectric capacitors towards long endurance and high temperature retention.
Wang, Sheng-Min; Liu, Cheng-Rui; Chen, Yu-Ting; Lee, Shao-Chen; Tang, Ying-Tsan.
Afiliação
  • Wang SM; Department of Electrical Engineering, National Central University, Taoyuan 320317, Taiwan, ROC.
  • Liu CR; Department of Electrical Engineering, National Central University, Taoyuan 320317, Taiwan, ROC.
  • Chen YT; Department of Electrical Engineering, National Central University, Taoyuan 320317, Taiwan, ROC.
  • Lee SC; Department of Electrical Engineering, National Central University, Taoyuan 320317, Taiwan, ROC.
  • Tang YT; Department of Electrical Engineering, National Central University, Taoyuan 320317, Taiwan, ROC.
Nanotechnology ; 35(20)2024 Feb 27.
Article em En | MEDLINE | ID: mdl-38316042
ABSTRACT
A novel defect control approach based on laminated HfO2/ZrO2with multifunctional TiN/Mo/TiOxNyelectrode is proposed to significantly improve the endurance and data retention in HZO-based ferroelectric capacitor. The O-rich interface reduces leakage current and prolong the endurance up to 1011cycles while retaining a 2Pr value of 34 (µC cm-2) at 3.4 MV cm-1. Using first-principles calculations and experiments, we demonstrate that the enhancement of endurance is ascribed to the higher migration barrier of oxygen vacancies within the laminated HZO film and higher work function of MoOx/TiOxNybetween top electrode and the insulating oxide. This 2.5 nm thick TiOxNybarrier further increase the grain size of HZO, lowering the activation field and thus improving polarization reversal speed. This interfacial layer further decreases the overall capacitance, increases the depolarization field, thereby enhancing the data retention. By fitting the data using the Arrhenius equation, we demonstrate a 10 years data retention is achieved at 109.6 °C, surpassing traditional SS-HZO of 78.2 °C with a 450 °C rapid thermal annealing (required by backend-of-the-line). This work elucidates that interfacial engineering serves as a crucial technology capable of resolving the endurance, storage capability, and high-temperature data retention issues for ferroelectric memory.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article