High-performance GeSi/Ge multi-quantum well photodetector on a Ge-buffered Si substrate.
Opt Lett
; 49(10): 2793-2796, 2024 May 15.
Article
em En
| MEDLINE
| ID: mdl-38748163
ABSTRACT
This work demonstrates a high-performance photodetector with a 4-cycle Ge0.86Si0.14/Ge multi-quantum well (MQW) structure grown by reduced pressure chemical vapor deposition techniques on a Ge-buffered Si (100) substrate. At -1â
V bias, the dark current density of the fabricated PIN mesa devices is as low as 3â
mA/cm2, and the optical responsivities are 0.51 and 0.17â
A/W at 1310 and 1550â
nm, respectively, corresponding to the cutoff wavelength of 1620â
nm. At the same time, the device has good high-power performance and continuous repeatable light response. On the other hand, the temperature coefficient of resistance (TCR) of the device is as high as -5.18%/K, surpassing all commercial thermal detectors. These results indicate that the CMOS-compatible and low-cost Ge0.86Si0.14/Ge multilayer structure is promising for short-wave infrared and uncooled infrared imaging.
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MEDLINE
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Ano de publicação:
2024
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Article