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Antimony-Platinum Modulated Contact Enabling Majority Carrier Polarity Selection on a Monolayer Tungsten Diselenide Channel.
Lin, Yu-Tung; Hsu, Ching-Hao; Chou, Ang-Sheng; Fong, Zi-Yun; Chuu, Chih-Piao; Chang, Shu-Jui; Hsu, Yu-Wei; Chou, Sui-An; Liew, San Lin; Chiu, Ting-Ying; Hou, Fa-Rong; Ni, I-Chih; Hou, Duen-Huei Vincent; Cheng, Chao-Ching; Radu, Iuliana P; Wu, Chih-I.
Afiliação
  • Lin YT; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Hsu CH; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Chou AS; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Fong ZY; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Chuu CP; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Chang SJ; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Hsu YW; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Chou SA; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Liew SL; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Chiu TY; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Hou FR; Quality & Reliability, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Ni IC; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Hou DV; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Cheng CC; Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 106, Taiwan.
  • Radu IP; Quality & Reliability, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
  • Wu CI; Corporate Research, Taiwan Semiconductor Manufacturing Company, Hsinchu 30091, Taiwan.
Nano Lett ; 24(29): 8880-8886, 2024 Jul 24.
Article em En | MEDLINE | ID: mdl-38981026
ABSTRACT
We develop a novel metal contact approach using an antimony (Sb)-platinum (Pt) bilayer to mitigate Fermi-level pinning in 2D transition metal dichalcogenide channels. This strategy allows for control over the transport polarity in monolayer WSe2 devices. By adjustment of the Sb interfacial layer thickness from 10 to 30 nm, the effective work function of the contact/WSe2 interface can be tuned from 4.42 eV (p-type) to 4.19 eV (n-type), enabling selectable n-/p-FET operation in enhancement mode. The shift in effective work function is linked to Sb-Se bond formation and an emerging n-doping effect. This work demonstrates high-performance n- and p-FETs with a single WSe2 channel through Sb-Pt contact modulation. After oxide encapsulation, the maximum current density at |VD| = 1 V reaches 170 µA/µm for p-FET and 165 µA/µm for n-FET. This approach shows promise for cost-effective CMOS transistor applications using a single channel material and metal contact scheme.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article