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All-2D-Materials Subthreshold-Free Field-Effect Transistor with Near-Ideal Switching Slope.
Hu, Jiayang; Li, Hanxi; Chen, Anzhe; Zhang, Yishu; Wang, Hailiang; Fu, Yu; Zhou, Xin; Loh, Kian Ping; Kang, Yu; Chai, Jian; Wang, Chenhao; Zhou, Jiachao; Miao, Jialei; Zhao, Yuda; Zhong, Shuai; Zhao, Rong; Liu, Kaihui; Xu, Yang; Yu, Bin.
Afiliação
  • Hu J; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Li H; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Chen A; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Zhang Y; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Wang H; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Fu Y; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Zhou X; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Loh KP; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Kang Y; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Chai J; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Wang C; State Key Laboratory for Mesoscopic Physics, Frontiers Science Center for Nano-optoelectronics, School of Physics, Peking University, Beijing 100871, China.
  • Zhou J; Department of Chemistry, National University of Singapore, Singapore 117543, Singapore.
  • Miao J; Department of Chemistry, National University of Singapore, Singapore 117543, Singapore.
  • Zhao Y; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Zhong S; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Zhao R; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
  • Liu K; ZJU-Hangzhou Global Scientific and Technological Innovation Center, Hangzhou, Zhejiang 311200, China.
  • Xu Y; School of Materials Science and Engineering, Zhejiang University, Hangzhou, Zhejiang 310027, China.
  • Yu B; College of Integrated Circuits, Zhejiang University, Hangzhou, Zhejiang 311200, China.
ACS Nano ; 2024 Jul 29.
Article em En | MEDLINE | ID: mdl-39073870
ABSTRACT
The Boltzmann Tyranny, set by thermionic statistics, dictates the lower limit of switching slope (SS) of a MOSFET to be 60 mV/dec, the fundamental barrier for low-dissipative electronics. The large SS leads to nonscalable voltage, significant leakage, and power consumption, particularly at short channels, making transistor scaling an intimidating challenge. In recent decades, an array of steep-slope transistors has been proposed; none is close to an ideal switch with ultimately abrupt switching (SS ∼ 0 mV/dec) between the binary logic states. We demonstrated an all-2D-materials van-der-Waals-heterostructure (vdW)-based FET that exhibits ultrasteep switching (0.33 mV/dec), a large on/off current ratio (∼107), and an ultralow off current (∼0.1 pA). The "Subthreshold-Free" operation achieved by the collective behavior of functional materials enables FET switching directly from the OFF-state to the ON-state with entirely eliminated subthreshold region, behaving as the ideal logic switch. Two-inch wafer-scale device fabrication is demonstrated. Boosted by device innovation and emerging materials, the research presents an advancement in achieving the "beyond-Boltzmann" transistors, overcoming one of the CMOS electronics' most infamous technology barriers that have plagued the research community for decades.
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Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article

Texto completo: 1 Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article