RESUMO
Optical metasurface technology promises an important potential for replacing bulky traditional optical components, in addition to enabling new compact and lightweight metasurface-based devices. Since even subtle imperfections in metasurface design or manufacture strongly affect their performance, there is an urgent need to develop proper and accurate protocols for their characterization, allowing for efficient control of the fabrication. We present non-destructive spectroscopic Mueller matrix ellipsometry in an uncommon off-specular configuration as a powerful tool for the characterization of orthogonal polarization beam-splitters based on a-Si:H nanopillars. Through Mueller matrix analysis, the spectroscopic polarimetric performance of the ±1 diffraction orders is experimentally demonstrated. This reveals a wavelength shift in the maximum efficiency caused by fabrication-induced conical pillars while still maintaining a polarimetric response close to ideal non-depolarizing Mueller matrices. We highlight the advantage of the spectroscopic Mueller matrix approach, which not only allows for monitoring and control of the fabrication process itself, but also verifies the initial design and produces feedback into the computational design.