Spatially selective narrow band and broadband absorption in Ag/SiO2/Ag based trilayer thin films by oblique angle deposition of SiO2layer.

We have experimentally demonstrated spatially selective absorption in Ag-SiO2-Ag based trilayer thin films by tuning the deposition angle of SiO2layer. These structures generate cavity resonance which can be tuned across the substrate locations due to spatially selective thickness and refractive index of silicon oxide (SiO2) film sandwiched between metallic silver (Ag) mirrors. Spatially selective property of SiO2film is obtained by oblique angle deposition technique using an electron beam evaporation system. The resonance wavelength of absorption in this trilayer structure shifts across the substrate locations along the direction of oblique deposition. The extent of shift in resonance increases with increase in angle of deposition of SiO2layer. 4.14 nm mm-1average shift of resonance wavelength is observed when SiO2is deposited at 40° whereas 4.76 nm mm-1average shift is observed when SiO2is deposited at 60°. We observed that the width of resonance increases with angle of deposition of the cavity layer and ultimately the resonant absorption disappears and becomes broadband when SiO2is deposited at glancing angle deposition (GLAD) configuration. Our study reveals that there is a suitable range of oblique angle of deposition from 40° to 60° for higher spatial tunability and resonant absorption whereas the absorption becomes broadband for glancing angle deposition.

Fabrication of TiO2-based broadband single-layer anti-reflection coating by collimated glancing angle deposition technique.

Single-sided TiO2 thin films were prepared using a modified glancing angle deposition (GLAD) technique. An additional flux collimation plate was introduced into the GLAD arrangement to enhance the degree of collimation of depositing vapour flux. Enhancement in the ballistic growth of film on the substrate was observed with increasing distance from the vapour source. The substrate position near to the vapour source (i.e. bottom region) showed a high refractive index (RI, ∼1.336 @ 550 nm wavelength) and lower average film transmittance (∼94.5% in 400-900 nm wavelength range) compared to the others. In contrast, the TiO2 coating deposited at a distant position from the source (i.e. top region) showed a remarkably low RI (∼1.190 @ 550 nm wavelength) and excellent anti-reflection over a broad spectral region with a maximum average transmittance (∼95.3% in 400-900 nm wavelength) compared to the other substrate positions. The reduction in film RI was correlated qualitatively with the morphological alterations in the coating for different substrate positions. With a further increase in distance from the vapour source, an ultimate reduction in the RI of TiO2 to ∼1.101 was observed, which was ∼50% lower than the bulk TiO2 value (∼2.221 @ 550 nm wavelength). The present study reports the lowest RI of TiO2 together with fabrication of a TiO2-based broadband single-layer anti-reflection coating.

Performance of Co/Ti multilayers in a water window soft x-ray regime.

The DC magnetron sputter grown Co/Ti multilayers, with ultra-low bi-layer thicknesses and with Co layers deposited under mixed ambience of argon and dry air, have been investigated for use in the water window soft x-ray regime of 23-44 Å. Initially, deposition parameters have been optimized for obtaining smooth and continuous low thickness Co and Ti single-layer films, and, then, multilayers with five bi-layers of various bi-layer thicknesses were deposited. The samples have been primarily characterized by the grazing incidence x-ray reflectivity (GIXR) measurements with a hard x-ray laboratory source. Subsequently, a set of multilayers with an increasing number of bi-layers has been deposited with a constant bi-layer thickness of 42 Å. GIXR results show that hard x-ray reflectivity at the first Bragg peak is maximum for the 20 bi-layer sample, beyond which the reflectivity decreases. Finally, the samples with the most promising hard x-ray GIXR have been used for soft x-ray reflectivity measurement with synchrotron radiation, and ∼2.5% peak reflectivity has been obtained in the multilayer sample at a 30.7 Å wavelength for a 21.5° grazing angle of incidence. The fitting results for both hard and soft x-ray reflectivities have been thoroughly investigated to find out the cause of the saturation of reflectivity with the increase in the number of bi-layers.

Effect of oxygen partial pressure in deposition ambient on the properties of RF magnetron sputter deposited Gd2O3 thin films.

Gadolinium oxide is an excellent optical material that offers high transmission in a wide wavelength range of 200-1600 nm and exhibits a high bulk refractive index of ∼1.80 at 550 nm. In the present study, a set of Gd2O3 thin films has been deposited on fused silica substrates by RF sputtering of a Gd2O3 target under various O2 to Ar flow ratios. The samples have been characterized by grazing incidence x-ray diffraction (GIXRD) to study the long range structural behavior, by GIXR to study density and surface roughness of the films, by atomic force microscopy measurements to study morphological properties, by Rutherford backscattering measurements for compositional studies, and by transmission spectrophotometry and spectroscopic ellipsometry techniques to study their optical properties. It has been observed that the films deposited with 10% oxygen partial pressure have low density, high surface roughness, and high void content, which results in a low value of refractive index of this film, and film quality improves as oxygen partial pressure is further increased. Extended x-ray absorption fine structure measurement with synchrotron radiation has also been employed to extract local structural information around Gd sites, which has in turn been used to explain some of the observed macroscopic properties of the films.