RESUMO
Back-gated InAs nanowire field-effect transistors are studied focusing on the formation of intrinsic quantum dots, i.e. dots not intentionally defined by electrodes. Such dots have been studied before, but the suggested explanations for their origin leave some open questions, which are addressed here. Stability diagrams of samples with different doping levels are recorded at electron temperatures below 200 mK, allowing us to estimate the number and size of the dots as well as the type of connection, i.e. in series or in parallel. We discuss several potential physical origins of the dots and conclude that they are most probably induced by potential fluctuations at the nanowire surface. Additionally, we show that via gate voltage and doping, the samples can be tuned to different regimes of Coulomb blockade.
RESUMO
We present a structuring technique based on the initialization of chemical reactions by an array of nano-LEDs which is used in the near-field as well as in the far-field regime. In the near-field regime, we demonstrate first results with the nano-LED array for lithography using the photoresist DiazoNaphthoQuinone-(DNQ)-sulfonate for the fabrication of holes in the resist down to â¼75 nanometres in diameter. In contrast, the nano-LEDs can also be employed in the far-field regime to expose thin films of the monomer bisphenol A-glycidyl methacrylate (Bis-GMA) and to initialize polymerization locally. Photosensitive films were patterned and spherical cone-shaped three dimensional objects with diameters ranging from â¼480 nm up to 20 micrometres were obtained. The modification in the material as a result of the photochemical reaction induced i.e. by polymerization was confirmed by Raman spectroscopy. This structuring maskless technique has the potential to induce substantial changes in photosensitive molecules and to produce the desired structures from the tens of microns down to the nanometre scale.