Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films.

Laterally ordered sub-10 nm features are produced from the directed self-assembly of poly(1,1-dimethyl silacyclo-butane)-block-poly(methyl methacrylate) (PDMSB-b-PMMA) thin films on sinusoidal azobenzene-containing patterns. The use of sinusoidal surface relief grating enables the formation of very large grain areas (over several µm(2) ) consisting of out-of-plane PMMA cylinders.

Raman scattering in protonated and deuterated 1,2-dipalmitoyl-sn-glycero-3-phosphatidylcholine (DPPC): Indicators of conformational and lateral orders.

The use of deuterocarbons is an effective method in the Raman spectroscopy of multicomponent lipid materials and biological samples. Here, Raman spectra of hydrated multilamellar vesicles of 1,2-dipalmitoyl-sn-glycero-3-phosphocholine (DPPC), its deuterated analog 1,2-dipalmitoyl-d62-sn-glycero-3-phosphocholine (DPPCd62), and DPPC-DPPCd62 mixtures were studied in a wide temperature range to specify the Raman indicators of conformational and lateral orders. The temperature dependence of the 985 cm-1 line in the deuterated phospholipid unequivocally indicates that this line corresponds to the CC stretching vibrations of deuterated hydrocarbon chains in the all-trans conformation. It was also concluded that the ratio of Raman intensities at the maximum of the peak of the symmetric CD2 stretching and at a maximum near 2168 cm-1 reflects the conformational order of the hydrocarbon chain and can be used for an evaluation of the fraction of the all-trans sequences. The frequency of the symmetric CD2 stretching peak is sensitive to the phase state (gel or fluid) but has a low sensitivity to the partial conformational disordering within the gel phase. The Raman study of DPPC-DPPCd62 mixtures reveals that the lateral order contributes to the ratio of intensities of the antisymmetric and symmetric CH2 stretching peaks as a prefactor enhancing the effect of conformational ordering.

Effect of Entrapped Solvent on the Evolution of Lateral Order in Self-Assembled P(S-r-MMA)/PS-b-PMMA Systems with Different Thicknesses.

Block copolymers (BCPs) are emerging as a cost-effective nanofabrication tool to complement conventional optical lithography because they self-assemble in highly ordered polymeric templates with well-defined sub-20-nm periodic features. In this context, cylinder-forming polystyrene-block-poly(methyl methacrylate) BCPs are revealed as an interesting material of choice because the orientation of the nanostructures with respect to the underlying substrate can be effectively controlled by a poly(styrene-random-methyl methacrylate) random copolymer (RCP) brush layer grafted to the substrate prior to BCP deposition. In this work, we investigate the self-assembly process and lateral order evolution in RCP + BCP systems consisting of cylinder-forming PS-b-PMMA (67 kg mol-1, PS fraction of ∼70%) films with thicknesses of 30, 70, 100, and 130 nm deposited on RCP brush layers having thicknesses ranging from 2 to 20 nm. The self-assembly process is promoted by a rapid thermal processing machine operating at 250 °C for 300 s. The level of lateral order is determined by measuring the correlation length (ξ) in the self-assembled BCP films. Moreover, the amount of solvent (Φ) retained in the RCP + BCP systems is measured as a function of the thicknesses of the RCP and BCP layers, respectively. In the 30-nm-thick BCP films, an increase in Φ as a function of the thickness of the RCP brush layer significantly affects the self-assembly kinetics and the final extent of the lateral order in the BCP films. Conversely, no significant variations of ξ are observed in the 70-, 100-, and 130-nm-thick BCP films with increasing Φ.