Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations.
Appl Opt
; 48(19): 3654-63, 2009 Jul 01.
Article
em En
| MEDLINE
| ID: mdl-19571920
ABSTRACT
A linear measurement model of lithographic projection lens aberrations is studied numerically based on the Hopkins theory of partially-coherent imaging and positive resist optical lithography (PROLITH) simulation. In this linearity model, the correlation between the mark's structure and its sensitivities to aberrations is analyzed. A method to design a mark with high sensitivity is proved and declared. By use of this method, a translational-symmetry alternating phase shifting mask (Alt-PSM) grating mark is redesigned with all of the even orders, +/-3rd and +/-5th order diffraction light missing. In the evaluation simulation, the measurement accuracies of aberrations prove to be enhanced apparently by use of the redesigned mark instead of the old ones.
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01-internacional
Base de dados:
MEDLINE
Idioma:
En
Ano de publicação:
2009
Tipo de documento:
Article