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Ultralow-power complementary metal-oxide-semiconductor inverters constructed on Schottky barrier modified nanowire metal-oxide-semiconductor field-effect-transistors.
Ma, R M; Peng, R M; Wen, X N; Dai, L; Liu, C; Sun, T; Xu, W J; Qin, G G.
Afiliação
  • Ma RM; School of Physics and State Key Lab for Mesoscopic Physics, Peking University, Beijing 100871, China.
J Nanosci Nanotechnol ; 10(10): 6428-31, 2010 Oct.
Article em En | MEDLINE | ID: mdl-21137742
ABSTRACT
We show that the threshold voltages of both n- and p-channel metal-oxide-semiconductor field-effect-transistors (MOSFETs) can be lowered to close to zero by adding extra Schottky contacts on top of nanowires (NWs). Novel complementary metal-oxide-semiconductor (CMOS) inverters are constructed on these Schottky barrier modified n- and p-channel NW MOSFETs. Based on the high performances of the modified n- and p-channel MOSFETs, especially the low threshold voltages, the as-fabricated CMOS inverters have low operating voltage, high voltage gain, and ultra-low static power dissipation.
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Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2010 Tipo de documento: Article
Buscar no Google
Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2010 Tipo de documento: Article