A unique approach to accurately measure thickness in thick multilayers.
J Synchrotron Radiat
; 19(Pt 3): 425-7, 2012 May.
Article
em En
| MEDLINE
| ID: mdl-22514179
ABSTRACT
X-ray optics called multilayer Laue lenses (MLLs) provide a promising path to focusing hard X-rays with high focusing efficiency at a resolution between 5â
nm and 20â
nm. MLLs consist of thousands of depth-graded thin layers. The thickness of each layer obeys the linear zone plate law. X-ray beamline tests have been performed on magnetron sputter-deposited WSi(2)/Si MLLs at the Advanced Photon Source/Center for Nanoscale Materials 26-ID nanoprobe beamline. However, it is still very challenging to accurately grow each layer at the designed thickness during deposition; errors introduced during thickness measurements of thousands of layers lead to inaccurate MLL structures. Here, a new metrology approach that can accurately measure thickness by introducing regular marks on the cross section of thousands of layers using a focused ion beam is reported. This new measurement method is compared with a previous method. More accurate results are obtained using the new measurement approach.
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01-internacional
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MEDLINE
Idioma:
En
Ano de publicação:
2012
Tipo de documento:
Article