Preparation of insulating SiO2 nanostructured thin films by the sol-gel process.
J Nanosci Nanotechnol
; 13(1): 279-87, 2013 Jan.
Article
em En
| MEDLINE
| ID: mdl-23646727
ABSTRACT
Organic dispersion agents can effectively decrease the surface roughness of films. Here, films containing organic dispersion agents are used to produce metal-insulator-metal structures. It was found that addition of Triton caused films to become denser, and thicker, and the leak current of devices to decrease by 10 times compared with that without Triton because of its uniform dispersion in the films. The resulting films were used as the insulator layer of thin film transistors containing a semiconductor layer of evaporated pentacene. The interface between the insulator and semiconductor layers was found to affect the arrangement of pentacene, and O2 plasma was used to improve the interface activity to increase the order of the pentacene molecules and enhance the carrier mobility of the devices.
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01-internacional
Base de dados:
MEDLINE
Assunto principal:
Transistores Eletrônicos
/
Dióxido de Silício
/
Cristalização
/
Nanoestruturas
/
Membranas Artificiais
Idioma:
En
Ano de publicação:
2013
Tipo de documento:
Article