Vertically aligned peptide nanostructures using plasma-enhanced chemical vapor deposition.
Biomacromolecules
; 15(2): 533-40, 2014 Feb 10.
Article
em En
| MEDLINE
| ID: mdl-24400716
ABSTRACT
In this study, we utilize plasma-enhanced chemical vapor deposition (PECVD) for the deposition of nanostructures composed of diphenylalanine. PECVD is a solvent-free approach and allows sublimation of the peptide to form dense, uniform arrays of peptide nanostructures on a variety of substrates. The PECVD deposited d-diphenylalanine nanostructures have a range of chemical and physical properties depending on the specific discharge parameters used during the deposition process.
Texto completo:
1
Coleções:
01-internacional
Base de dados:
MEDLINE
Assunto principal:
Peptídeos
/
Fenilalanina
/
Nanoestruturas
/
Gases em Plasma
Idioma:
En
Ano de publicação:
2014
Tipo de documento:
Article