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In-situ and elementally resolved determination of the thickness uniformity of multi-ply films by confocal micro XRF.
Peng, Song; Liu, Zhiguo; Sun, Tianxi; Wang, Guangfu; Ma, Yongzhong; Ding, Xunliang.
Afiliação
  • Peng S; The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education, Beijing Normal University, Beijing 100875, China; College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China.
  • Liu Z; The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education, Beijing Normal University, Beijing 100875, China; College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China.
  • Sun T; The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education, Beijing Normal University, Beijing 100875, China; College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China. Electronic ad
  • Wang G; The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education, Beijing Normal University, Beijing 100875, China; College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China.
  • Ma Y; Center for Disease Control and Prevention of Beijing, Beijing 100013, China.
  • Ding X; The Key Laboratory of Beam Technology and Materials Modification of the Ministry of Education, Beijing Normal University, Beijing 100875, China; College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China.
Appl Radiat Isot ; 90: 84-8, 2014 Aug.
Article em En | MEDLINE | ID: mdl-24705010
ABSTRACT
Confocal micro X-ray fluorescence (CM-XRF) with quasi-monochromatic excitation based on polycapillary X-ray optics was used to measure the thickness of multi-ply films. The relative errors of measuring an Fe film with a thickness of 16.3 µm and a Cu film with a thickness of 24.5 µm were 7.3% and 0.4%, respectively. The non-destructive and in-situ measurement of the thickness and uniformity of multi-ply films of Cu, Fe and Ni on a silicon surface was performed. CM-XRF was convenient in in-situ and elementally resolved analysis of the thickness of multi-ply films without a cumbersome theoretical correction model.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2014 Tipo de documento: Article
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2014 Tipo de documento: Article