In-situ and elementally resolved determination of the thickness uniformity of multi-ply films by confocal micro XRF.
Appl Radiat Isot
; 90: 84-8, 2014 Aug.
Article
em En
| MEDLINE
| ID: mdl-24705010
ABSTRACT
Confocal micro X-ray fluorescence (CM-XRF) with quasi-monochromatic excitation based on polycapillary X-ray optics was used to measure the thickness of multi-ply films. The relative errors of measuring an Fe film with a thickness of 16.3 µm and a Cu film with a thickness of 24.5 µm were 7.3% and 0.4%, respectively. The non-destructive and in-situ measurement of the thickness and uniformity of multi-ply films of Cu, Fe and Ni on a silicon surface was performed. CM-XRF was convenient in in-situ and elementally resolved analysis of the thickness of multi-ply films without a cumbersome theoretical correction model.
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01-internacional
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MEDLINE
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En
Ano de publicação:
2014
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Article