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Atomic Layer Deposition of Hafnium(IV) Oxide on Graphene Oxide: Probing Interfacial Chemistry and Nucleation by using X-ray Absorption and Photoelectron Spectroscopies.
Alivio, Theodore E G; De Jesus, Luis R; Dennis, Robert V; Jia, Ye; Jaye, Cherno; Fischer, Daniel A; Singisetti, Uttam; Banerjee, Sarbajit.
Afiliação
  • Alivio TEG; Department of Chemistry, Texas A&M University, College Station, Texas 77842-3012 (USA).
  • De Jesus LR; Department of Materials Science and Engineering, Texas A&M University, College Station, Texas 77843-3003 (USA).
  • Dennis RV; Department of Chemistry, Texas A&M University, College Station, Texas 77842-3012 (USA).
  • Jia Y; Department of Materials Science and Engineering, Texas A&M University, College Station, Texas 77843-3003 (USA).
  • Jaye C; Department of Chemistry, Texas A&M University, College Station, Texas 77842-3012 (USA).
  • Fischer DA; Department of Materials Science and Engineering, Texas A&M University, College Station, Texas 77843-3003 (USA).
  • Singisetti U; Department of Electrical Engineering, University at Buffalo, The State University of New York, Buffalo, New York 14260-3000 (USA).
  • Banerjee S; Material Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland 20899 (USA).
Chemphyschem ; 16(13): 2842-2848, 2015 Sep 14.
Article em En | MEDLINE | ID: mdl-26227822
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2015 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2015 Tipo de documento: Article