Effect of an Ag Insertion Layer on the Optical and Electrical Properties of Ga Doped Zinc Oxide Films.

ABSTRACT

GZO/Ag/GZO films were investigated for use as high quality transparent conductive electrodes. The GZO and Ag films were deposited by RF sputtering and electron beam evaporation, respectively, at room temperature. The effects of Ag thickness and post heat treatment on the structural, electrical and optical properties of these multilayer films were investigated. The insertion of the Ag layer with optimized thickness between the GZO layers and the optimized annealing temperature improved the electrical and optical properties of the GZO/Ag/GZO film due to the very low resistivity and surface plasmon effect of the Ag layer. The best multilayer film exhibited a low resistivity of 2.2 x 10(-5) Ω · cm and a transmittance of 88.9%.