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A perfectly stoichiometric and flat CeO2(111) surface on a bulk-like ceria film.
Barth, C; Laffon, C; Olbrich, R; Ranguis, A; Parent, Ph; Reichling, M.
Afiliação
  • Barth C; Aix-Marseille University, CNRS, CINaM UMR 7325, 13288 Marseille, France.
  • Laffon C; Aix-Marseille University, CNRS, CINaM UMR 7325, 13288 Marseille, France.
  • Olbrich R; Fachbereich Physik, Universität Osnabrück, Barbarastr. 7, 49076 Osnabrück, Germany.
  • Ranguis A; Aix-Marseille University, CNRS, CINaM UMR 7325, 13288 Marseille, France.
  • Parent P; Aix-Marseille University, CNRS, CINaM UMR 7325, 13288 Marseille, France.
  • Reichling M; Fachbereich Physik, Universität Osnabrück, Barbarastr. 7, 49076 Osnabrück, Germany.
Sci Rep ; 6: 21165, 2016 Feb 16.
Article em En | MEDLINE | ID: mdl-26879800
In surface science and model catalysis, cerium oxide (ceria) is mostly grown as an ultra-thin film on a metal substrate in the ultra-high vacuum to understand fundamental mechanisms involved in diverse surface chemistry processes. However, such ultra-thin films do not have the contribution of a bulk ceria underneath, which is currently discussed to have a high impact on in particular surface redox processes. Here, we present a fully oxidized ceria thick film (180 nm) with a perfectly stoichiometric CeO2(111) surface exhibiting exceptionally large, atomically flat terraces. The film is well-suited for ceria model studies as well as a perfect substitute for CeO2 bulk material.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2016 Tipo de documento: Article