Redox Isomeric Surface Structures Are Preferred over Odd-Electron Pt<sup>1</sup>.

Tempas, Christopher D; Skomski, Daniel; Cook, Brian J; Le, Duy; Smith, Kevin A; Rahman, Talat S; Caulton, Kenneth G; Tait, Steven L

Redox Isomeric Surface Structures Are Preferred over Odd-Electron Pt¹.

Tempas, Christopher D; Skomski, Daniel; Cook, Brian J; Le, Duy; Smith, Kevin A; Rahman, Talat S; Caulton, Kenneth G; Tait, Steven L.

Afiliação

Tempas CD; Department of Chemistry, Indiana University, Bloomington, Indiana, 47405, USA.
Skomski D; Department of Chemistry, Indiana University, Bloomington, Indiana, 47405, USA.
Cook BJ; Current address: Merck and Co., 770 Sumneytown Pike, West Point, Pennsylvania, 19486, USA.
Le D; Department of Chemistry, Indiana University, Bloomington, Indiana, 47405, USA.
Smith KA; Current address: Center for Catalysis and Florida Center for Heterocyclic Compounds, University of Florida, Gainesville, Florida, 32611, USA.
Rahman TS; Department of Physics, University of Central Florida, Orlando, Florida, 32816, USA.
Caulton KG; Department of Physics, Indiana University, Bloomington, Indiana, 47405, USA.
Tait SL; Department of Physics, University of Central Florida, Orlando, Florida, 32816, USA.

Chemistry ; 24(59): 15852-15858, 2018 Oct 22.

Article em En | MEDLINE | ID: mdl-30028543

Palavras-chave

charge transfer; density functional calculations; reduction-oxidation isomers; self-assembly; valency

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2018 Tipo de documento: Article

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2018 Tipo de documento: Article