Spontaneous Generation of a Molecular Thin Hydrophobic Skin Layer on a Sub-20 nm, High-<i>k</i> Polymer Dielectric for Extremely Stable Organic Thin-Film Transistor Operation.

Choi, Junhwan; Yoon, Jongsun; Kim, Min Ju; Pak, Kwanyong; Lee, Changhyeon; Lee, Haechang; Jeong, Kihoon; Ihm, Kyuwook; Yoo, Seunghyup; Cho, Byung Jin; Lee, Hyomin; Im, Sung Gap

Spontaneous Generation of a Molecular Thin Hydrophobic Skin Layer on a Sub-20 nm, High-k Polymer Dielectric for Extremely Stable Organic Thin-Film Transistor Operation.

Choi, Junhwan; Yoon, Jongsun; Kim, Min Ju; Pak, Kwanyong; Lee, Changhyeon; Lee, Haechang; Jeong, Kihoon; Ihm, Kyuwook; Yoo, Seunghyup; Cho, Byung Jin; Lee, Hyomin; Im, Sung Gap.

Afiliação

Choi J; Department of Chemical and Biomolecular Engineering and KI for NanoCentury , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Yoon J; Department of Chemical Engineering , Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro , Nam-gu, Pohang , Gyeongbuk 37673 , Republic of Korea.
Kim MJ; School of Electrical Engineering and KI for NanoCentury at Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Pak K; Department of Chemical and Biomolecular Engineering and KI for NanoCentury , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Lee C; Department of Chemical and Biomolecular Engineering and KI for NanoCentury , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Lee H; School of Electrical Engineering and KI for NanoCentury at Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Jeong K; Department of Chemical and Biomolecular Engineering and KI for NanoCentury , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Ihm K; Nano & Interface Research Team , Pohang Accelerator Laboratory , Pohang , Gyeongbuk 37673 , Republic of Korea.
Yoo S; School of Electrical Engineering and KI for NanoCentury at Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Cho BJ; School of Electrical Engineering and KI for NanoCentury at Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.
Lee H; Department of Chemical Engineering , Pohang University of Science and Technology (POSTECH) , 77 Cheongam-ro , Nam-gu, Pohang , Gyeongbuk 37673 , Republic of Korea.
Im SG; Department of Chemical and Biomolecular Engineering and KI for NanoCentury , Korea Advanced Institute of Science and Technology (KAIST) , 291 Daehak-ro , Yuseong-gu, Daejeon 34141 , Republic of Korea.

ACS Appl Mater Interfaces ; 11(32): 29113-29123, 2019 Aug 14.

Article em En | MEDLINE | ID: mdl-31333023

Palavras-chave

hydrophobic skin layer; initiated chemical vapor deposition (iCVD); operational stability; organic thin-film transistor (OTFT); polymer dielectric; polymer thin film

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2019 Tipo de documento: Article

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2019 Tipo de documento: Article