Ferroelectric Tunnel Junctions Enhanced by a Polar Oxide Barrier Layer.

Yang, Qiong; Tao, Lingling; Zhang, Yuke; Li, Ming; Jiang, Zhen; Tsymbal, Evgeny Y; Alexandrov, Vitaly

Yang, Qiong; Tao, Lingling; Zhang, Yuke; Li, Ming; Jiang, Zhen; Tsymbal, Evgeny Y; Alexandrov, Vitaly.

Afiliação

Yang Q; Department of Chemical and Biomolecular Engineering , University of Nebraska , Lincoln , Nebraska 68588 , United States.
Tao L; School of Materials Science and Engineering , Xiangtan University , Xiangtan , Hunan 411105 , China.
Zhang Y; Department of Physics and Astronomy , University of Nebraska , Lincoln , Nebraska 68588 , United States.
Li M; School of Materials Science and Engineering , Xiangtan University , Xiangtan , Hunan 411105 , China.
Jiang Z; Department of Physics and Astronomy , University of Nebraska , Lincoln , Nebraska 68588 , United States.
Tsymbal EY; Department of Chemical and Biomolecular Engineering , University of Nebraska , Lincoln , Nebraska 68588 , United States.
Alexandrov V; Department of Physics and Astronomy , University of Nebraska , Lincoln , Nebraska 68588 , United States.

Nano Lett ; 19(10): 7385-7393, 2019 10 09.

Article em En | MEDLINE | ID: mdl-31514498

Palavras-chave

2D electron gas; 2D hole gas; Ferroelectric tunnel junctions; composite barrier; head-to-head domain wall; tunneling electroresistance effect

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2019 Tipo de documento: Article

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PubMed Links

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2019 Tipo de documento: Article