Thickness-Insensitive Properties of &#945;-MoO<sub>3</sub> Nanosheets by Weak Interlayer Coupling.

Kim, Jong Hun; Hyun, Changbae; Kim, Hangyel; Dash, Jatis Kumar; Ihm, Kyuwook; Lee, Gwan-Hyoung

Thickness-Insensitive Properties of α-MoO₃ Nanosheets by Weak Interlayer Coupling.

Kim, Jong Hun; Hyun, Changbae; Kim, Hangyel; Dash, Jatis Kumar; Ihm, Kyuwook; Lee, Gwan-Hyoung.

Afiliação

Hyun C; Department of Physics , Pohang University of Science and Technology , 37673 , Pohang , Korea.
Dash JK; Department of Physics , SRM University-AP , Amaravati , Andhra Pradesh 522502 , India.
Ihm K; Department of Physics and Pohang Accelerator Laboratory , Pohang University of Science and Technology , 37673 , Pohang , Korea.

Nano Lett ; 19(12): 8868-8876, 2019 12 11.

Article em En | MEDLINE | ID: mdl-31702164

Palavras-chave

Molybdenum oxide; dielectric constant; friction; tunneling; van der Waals epitaxy; work function

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2019 Tipo de documento: Article

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2019 Tipo de documento: Article