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Slippery and Wear-Resistant Surfaces Enabled by Interface Engineered Graphene.
Dwivedi, Neeraj; Patra, Tarak; Lee, Jae-Bok; Yeo, Reuben J; Srinivasan, Srilok; Dutta, Tanmay; Sasikumar, Kiran; Dhand, Chetna; Tripathy, Sudhiranjan; Saifullah, Mohammad S M; Danner, Aaron; Hashmi, S A R; Srivastava, A K; Ahn, Jong-Hyun; Sankaranarayanan, Subramanian K R S; Yang, Hyunsoo; Bhatia, Charanjit S.
Afiliação
  • Dwivedi N; CSIR-Advanced Materials and Processes Research Institute , Bhopal 462026 , India.
  • Patra T; Center for Nanoscale Materials , Argonne National Laboratory , 9700 S. Cass Avenue , Argonne , Illinois 60439 , United States.
  • Lee JB; School of Electrical and Electronic Engineering , Yonsei University , Seoul 03722 , Republic of Korea.
  • Yeo RJ; Institute of Materials , Ecole Polytechnique Fédérale de Lausanne , 1015 Lausanne , Switzerland.
  • Srinivasan S; Center for Nanoscale Materials , Argonne National Laboratory , 9700 S. Cass Avenue , Argonne , Illinois 60439 , United States.
  • Dutta T; Department of Electrical and Computer Engineering , National University of Singapore , Singapore 117583 , Republic of Singapore.
  • Sasikumar K; Center for Nanoscale Materials , Argonne National Laboratory , 9700 S. Cass Avenue , Argonne , Illinois 60439 , United States.
  • Dhand C; CSIR-Advanced Materials and Processes Research Institute , Bhopal 462026 , India.
  • Tripathy S; Institute of Materials Research and Engineering , A*STAR (Agency for Science, Technology, and Research) , 2 Fusionopolis Way, Innovis, 08-03 , Singapore 138634 , Republic of Singapore.
  • Saifullah MSM; Institute of Materials Research and Engineering , A*STAR (Agency for Science, Technology, and Research) , 2 Fusionopolis Way, Innovis, 08-03 , Singapore 138634 , Republic of Singapore.
  • Danner A; Department of Electrical and Computer Engineering , National University of Singapore , Singapore 117583 , Republic of Singapore.
  • Hashmi SAR; CSIR-Advanced Materials and Processes Research Institute , Bhopal 462026 , India.
  • Srivastava AK; CSIR-Advanced Materials and Processes Research Institute , Bhopal 462026 , India.
  • Ahn JH; School of Electrical and Electronic Engineering , Yonsei University , Seoul 03722 , Republic of Korea.
  • Sankaranarayanan SKRS; Center for Nanoscale Materials , Argonne National Laboratory , 9700 S. Cass Avenue , Argonne , Illinois 60439 , United States.
  • Yang H; Department of Mechanical and Industrial Engineering , University of Illinois , Chicago , Illinois 60607 , United States.
  • Bhatia CS; Department of Electrical and Computer Engineering , National University of Singapore , Singapore 117583 , Republic of Singapore.
Nano Lett ; 20(2): 905-917, 2020 Feb 12.
Article em En | MEDLINE | ID: mdl-31891512
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article