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Multilayer InSe-Te van der Waals Heterostructures with an Ultrahigh Rectification Ratio and Ultrasensitive Photoresponse.
Qin, Fanglu; Gao, Feng; Dai, Mingjin; Hu, Yunxia; Yu, Miaomiao; Wang, Lifeng; Feng, Wei; Li, Bin; Hu, PingAn.
Afiliação
  • Qin F; Key Laboratory of Forest Plant Ecology, Ministry of Education, Northeast Forestry University, Harbin 150040, China.
  • Gao F; College of Chemistry, Chemical Engineering and Resource Utilization, Northeast Forestry University, Harbin 150040, China.
  • Dai M; School of Materials and Engineering, Harbin Institute of Technology, Harbin 150080, China.
  • Hu Y; School of Materials and Engineering, Harbin Institute of Technology, Harbin 150080, China.
  • Yu M; School of Materials and Engineering, Harbin Institute of Technology, Harbin 150080, China.
  • Wang L; Key Laboratory of Forest Plant Ecology, Ministry of Education, Northeast Forestry University, Harbin 150040, China.
  • Feng W; College of Chemistry, Chemical Engineering and Resource Utilization, Northeast Forestry University, Harbin 150040, China.
  • Li B; Institute for Frontier Materials, Deakin University, 75 Pigdons Road, Waurn Ponds, Geelong, Victoria 3216, Australia.
  • Hu P; Key Laboratory of Forest Plant Ecology, Ministry of Education, Northeast Forestry University, Harbin 150040, China.
ACS Appl Mater Interfaces ; 12(33): 37313-37319, 2020 Aug 19.
Article em En | MEDLINE | ID: mdl-32814416
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article
Texto completo
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PubMed Links
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2020 Tipo de documento: Article