Your browser doesn't support javascript.
loading
Hysteresis-free MoS2 metal semiconductor field-effect transistors with van der Waals Schottky junction.
Wan, Da; Wang, Qixia; Huang, Hao; Jiang, Bei; Chen, Chen; Yang, Zhenyu; Li, Guoli; Liu, Chuansheng; Liu, Xingqiang; Liao, Lei.
Afiliação
  • Wan D; School of Information Science and Engineering, Wuhan University of Science and Technology, Wuhan, 430081, People's Republic of China.
Nanotechnology ; 32(13): 135201, 2021 Jan 07.
Article em En | MEDLINE | ID: mdl-33410417
ABSTRACT
Hysteresis-free and steep subthreshold swing (SS) are essential for low-power reliable electronics. Herein, MoS2 metal semiconductor field-effect transistors are fabricated with GeSe/MoS2 van der Waals Schottky junction as a local gate, in which the rectification behavior of the heterojunction offers the modulation of channel carriers. The trap-free gate interface enables the hysteresis-free characteristics of the transistors, and promises an ideal SS of 64 mV/dec at room temperature. All the devices operate with a low threshold voltage less than -1 V with desirable saturation behavior. An OR logic gate is constructed with the dual-gated MoS2 transistors by varying the back and top gate voltage. The strategy present here is promising for the design of low-power digital electronics based on 2D materials.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article