Re-examination of the Aqueous Stability of Atomic Layer Deposited (ALD) Amorphous Alumina (Al<sub>2</sub>O<sub>3</sub>) Thin Films and the Use of a Postdeposition Air Plasma Anneal to Enhance Stability.

Willis, Simon A; McGuinness, Emily K; Li, Yi; Losego, Mark D

Re-examination of the Aqueous Stability of Atomic Layer Deposited (ALD) Amorphous Alumina (Al₂O₃) Thin Films and the Use of a Postdeposition Air Plasma Anneal to Enhance Stability.

Willis, Simon A; McGuinness, Emily K; Li, Yi; Losego, Mark D.

Afiliação

Willis SA; School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.
McGuinness EK; School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.
Li Y; School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.
Losego MD; School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332, United States.

Langmuir ; 37(49): 14509-14519, 2021 Dec 14.

Article em En | MEDLINE | ID: mdl-34851123

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2021 Tipo de documento: Article