Frequency Dependent Silica Dissolution Rate Enhancement under Oscillating Pressure via an Electrochemical Pressure Solution-like, Surface Resonance Mechanism.

Fraysse, Kilian Shani; Meaney, Shane P; Gates, Will P; Langley, Daniel P; Tabor, Rico F; Stoddart, Paul R; Greene, George W

Fraysse, Kilian Shani; Meaney, Shane P; Gates, Will P; Langley, Daniel P; Tabor, Rico F; Stoddart, Paul R; Greene, George W.

Afiliação

Fraysse KS; Institute for Frontier Materials and ARC Centre of Excellence for Electromaterials Science, Deakin University, Waurn Ponds, 3216, Australia.
Meaney SP; School of Chemistry, Monash University, Clayton, 3800, Australia.
Gates WP; Institute for Frontier Materials and ARC Centre of Excellence for Electromaterials Science, Deakin University, Waurn Ponds, 3216, Australia.
Langley DP; School of Science, Computing and Engineering Technology, Swinburne University of Technology, Hawthorn, 3122, Australia.
Tabor RF; Biomedical Manufacturing, CSIRO Manufacturing, Clayton, 3168, Australia.
Stoddart PR; School of Chemistry, Monash University, Clayton, 3800, Australia.
Greene GW; School of Science, Computing and Engineering Technology, Swinburne University of Technology, Hawthorn, 3122, Australia.

J Am Chem Soc ; 144(9): 3875-3891, 2022 03 09.

Article em En | MEDLINE | ID: mdl-35226480

Assuntos

Dióxido de Silício; Água; Cinética; Microscopia de Força Atômica; Solubilidade

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Assunto principal: Água / Dióxido de Silício Tipo de estudo: Prognostic_studies Idioma: En Ano de publicação: 2022 Tipo de documento: Article

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