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Integrated silicon carbide electro-optic modulator.
Powell, Keith; Li, Liwei; Shams-Ansari, Amirhassan; Wang, Jianfu; Meng, Debin; Sinclair, Neil; Deng, Jiangdong; Loncar, Marko; Yi, Xiaoke.
Afiliação
  • Powell K; School of Electrical and Information Engineering, The University of Sydney, Sydney, NSW, 2006, Australia.
  • Li L; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA, 02138, USA.
  • Shams-Ansari A; School of Electrical and Information Engineering, The University of Sydney, Sydney, NSW, 2006, Australia.
  • Wang J; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA, 02138, USA.
  • Meng D; School of Electrical and Information Engineering, The University of Sydney, Sydney, NSW, 2006, Australia.
  • Sinclair N; School of Electrical and Information Engineering, The University of Sydney, Sydney, NSW, 2006, Australia.
  • Deng J; John A. Paulson School of Engineering and Applied Sciences, Harvard University, Cambridge, MA, 02138, USA.
  • Loncar M; Division of Physics, Mathematics and Astronomy, and Alliance for Quantum Technologies (AQT), California Institute of Technology, 1200 E. California Boulevard, Pasadena, CA, 91125, USA.
  • Yi X; Center for Nanoscale Systems, Harvard University, Cambridge, MA, 02138, USA.
Nat Commun ; 13(1): 1851, 2022 Apr 05.
Article em En | MEDLINE | ID: mdl-35383188
ABSTRACT
Owing to its attractive optical and electronic properties, silicon carbide is an emerging platform for integrated photonics. However an integral component of the platform is missing-an electro-optic modulator, a device which encodes electrical signals onto light. As a non-centrosymmetric crystal, silicon carbide exhibits the Pockels effect, yet a modulator has not been realized since the discovery of this effect more than three decades ago. Here we design, fabricate, and demonstrate a Pockels modulator in silicon carbide. Specifically, we realize a waveguide-integrated, small form-factor, gigahertz-bandwidth modulator that operates using complementary metal-oxide-semiconductor (CMOS)-level voltages on a thin film of silicon carbide on insulator. Our device is fabricated using a CMOS foundry compatible fabrication process and features no signal degradation, no presence of photorefractive effects, and stable operation at high optical intensities (913 kW/mm2), allowing for high optical signal-to-noise ratios for modern communications. Our work unites Pockels electro-optics with a CMOS foundry compatible platform in silicon carbide.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article