Sub-nanometer misalignment sensing for lithography with structured illumination.
Opt Lett
; 47(17): 4427-4430, 2022 Sep 01.
Article
em En
| MEDLINE
| ID: mdl-36048670
ABSTRACT
Lithography for the next generation of integrated-circuit manufacturing at the 3â
nm node requires sub-1-nm misalignment measurement accuracy, which is almost impossible for existing systems due to the optical diffraction limit. Herein, we propose a misalignment sensing strategy based on structured illumination. By virtue of the distinctive modulation effect of a Talbot diffractive illuminated field on moiré fringes, the measurement signals can pass unhindered through the optical system and be used for sensing. Experiments are used to demonstrate that the proposed method can implement real-time-lapse (100â
Hz) misalignment sensing with an accuracy of sub-1-nm (0.31â
nm @ 3σ), making it suitable for various lithography techniques (e.g., proximity, x ray, projective, and nanoimprint lithography) and fields requiring advanced precision measurement (e.g., quantum measurement, gravitational wave detection, and molecular biology).
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Coleções:
01-internacional
Base de dados:
MEDLINE
Idioma:
En
Ano de publicação:
2022
Tipo de documento:
Article