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Structural and Electrical Response of Emerging Memories Exposed to Heavy Ion Radiation.
Vogel, Tobias; Zintler, Alexander; Kaiser, Nico; Guillaume, Nicolas; Lefèvre, Gauthier; Lederer, Maximilian; Serra, Anna Lisa; Piros, Eszter; Kim, Taewook; Schreyer, Philipp; Winkler, Robert; Nasiou, Déspina; Olivo, Ricardo Revello; Ali, Tarek; Lehninger, David; Arzumanov, Alexey; Charpin-Nicolle, Christelle; Bourgeois, Guillaume; Grenouillet, Laurent; Cyrille, Marie-Claire; Navarro, Gabriele; Seidel, Konrad; Kämpfe, Thomas; Petzold, Stefan; Trautmann, Christina; Molina-Luna, Leopoldo; Alff, Lambert.
Afiliação
  • Vogel T; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Zintler A; Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Kaiser N; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Guillaume N; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Lefèvre G; CNRS-LTM, CEA, LETI, 38054 Grenoble, France.
  • Lederer M; Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany.
  • Serra AL; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Piros E; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Kim T; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Schreyer P; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Winkler R; Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Nasiou D; Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Olivo RR; Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany.
  • Ali T; Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany.
  • Lehninger D; Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany.
  • Arzumanov A; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Charpin-Nicolle C; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Bourgeois G; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Grenouillet L; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Cyrille MC; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Navarro G; CEA, LETI, Univ. Grenoble Alpes, 38000 Grenoble, France.
  • Seidel K; Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany.
  • Kämpfe T; Fraunhofer IMPS, Center Nanoelectronic Technologies (CNT), 01109 Dresden, Germany.
  • Petzold S; Advanced Thin Film Technology Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
  • Trautmann C; GSI Helmholtzzentrum fuer Schwerionenforschung, 64291 Darmstadt, Germany.
  • Molina-Luna L; Institute of Materials Science, TU Darmstadt, 64287 Darmstadt, Germany.
  • Alff L; Advanced Electron Microscopy Division, Institute of Materials Science, TU Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, Germany.
ACS Nano ; 16(9): 14463-14478, 2022 Sep 27.
Article em En | MEDLINE | ID: mdl-36113861
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2022 Tipo de documento: Article