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Tiling the Silicon for Added Functionality: PLD Growth of Highly Crystalline STO and PZT on Graphene Oxide-Buffered Silicon Surface.
Jovanovic, Zoran; Trstenjak, Urska; Ho, Hsin-Chia; Butsyk, Olena; Chen, Binbin; Tchernychova, Elena; Borodavka, Fedir; Koster, Gertjan; Hlinka, Jirí; Spreitzer, Matjaz.
Afiliação
  • Jovanovic Z; Advanced Materials Department, Jozef Stefan Institute, 1000 Ljubljana, Slovenia.
  • Trstenjak U; Laboratory of Physics, Vinca Institute of Nuclear Sciences─National Institute of the Republic of Serbia, University of Belgrade, 11351 Belgrade, Serbia.
  • Ho HC; Advanced Materials Department, Jozef Stefan Institute, 1000 Ljubljana, Slovenia.
  • Butsyk O; Advanced Materials Department, Jozef Stefan Institute, 1000 Ljubljana, Slovenia.
  • Chen B; Department of Dielectrics, Institute of Physics of the Czech Academy of Sciences, 182 00 Prague, Czech Republic.
  • Tchernychova E; MESA+ Institute for Nanotechnology, University of Twente, 7522 NB Enschede, The Netherlands.
  • Borodavka F; Key Laboratory of Polar Materials and Devices (MOE) and Department of Electronics, East China Normal University, 200241 Shanghai, China.
  • Koster G; National Institute of Chemistry, 1000 Ljubljana, Slovenia.
  • Hlinka J; Department of Dielectrics, Institute of Physics of the Czech Academy of Sciences, 182 00 Prague, Czech Republic.
  • Spreitzer M; MESA+ Institute for Nanotechnology, University of Twente, 7522 NB Enschede, The Netherlands.
ACS Appl Mater Interfaces ; 15(4): 6058-6068, 2023 Feb 01.
Article em En | MEDLINE | ID: mdl-36653314
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article
Texto completo
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2023 Tipo de documento: Article