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Electron Release via Internal Polarization Fields for Optimal S-H Bonding States.
Seok, Hyunho; Kim, Minjun; Cho, Jinill; Son, Sihoon; Megra, Yonas Tsegaye; Lee, Jinhyoung; Nam, Myeong Gyun; Kim, Keon-Woo; Aydin, Kubra; Yoo, Seong Soo; Lee, Hyeonjeong; Kanade, Vinit K; Kim, Muyoung; Mun, Jihun; Kim, Jin Kon; Suk, Ji Won; Kim, Hyeong-U; Yoo, Pil J; Kim, Taesung.
Afiliação
  • Seok H; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Kim M; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Cho J; School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Son S; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Megra YT; School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Lee J; School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Nam MG; School of Chemical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Kim KW; Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyeongbuk, 790-784, Republic of Korea.
  • Aydin K; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Yoo SS; School of Chemical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Lee H; School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Kanade VK; School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Kim M; Plasma Engineering Laboratory, Korea Institute of Machinery and Materials, Daejeon, 34103, Republic of Korea.
  • Mun J; Advanced Instrumentation Institute, Korea Research Institute of Standards and Science, Daejeon, 34113, Republic of Korea.
  • Kim JK; Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang, Gyeongbuk, 790-784, Republic of Korea.
  • Suk JW; SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Kim HU; School of Mechanical Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 16419, Republic of Korea.
  • Yoo PJ; Department of Smart-Fab. Technology, Sungkyunkwan University, Suwon, 16419, Republic of Korea.
  • Kim T; Plasma Engineering Laboratory, Korea Institute of Machinery and Materials, Daejeon, 34103, Republic of Korea.
Adv Mater ; : e2411211, 2024 Sep 09.
Article em En | MEDLINE | ID: mdl-39246277
ABSTRACT
Transition metal dichalcogenides (TMDs) have received considerable attention as promising electrocatalysts for the hydrogen evolution reaction (HER), yet their potential is often constrained by the inertness of the basal planes arising from their poor hydrogen adsorption ability. Here, the relationship between the electronic structure of the WS2 basal plane and HER activity is systemically analyzed to establish a clear insight. The valance state of the sulfur atoms on the basal plane has been tuned to enhance hydrogen adsorption through sequential engineering processes, including direct phase transition and heterostructure that induces work function-difference-induced unidirectional electron transfer. Additionally, an innovative synthetic approach, harnessing the built-in internal polarization field at the W-graphene heterointerface, triggers the in-situ formation of sulfur vacancies in the bottom WSx (x < 2) layers. The resultant modulation of the valance state of the sulfur atom stabilizes the W-S bond, while destabilizing the S-H bond. The electronic structural changes are further amplified by the release and transfer of surplus electrons via sulfur vacancies, filling the valance state of W and S atoms. Consequently, this work provides a comprehensive understanding of the interplay between the electronic structure of the WS2 basal plane and the HER activity, focusing on optimizing S-H bonding state.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Ano de publicação: 2024 Tipo de documento: Article