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Opt Express ; 20(2): 1825-38, 2012 Jan 16.
Artigo em Inglês | MEDLINE | ID: mdl-22274527

RESUMO

We present an innovative grating design based on conical diffraction which acts as an almost perfect and low-loss beamsplitter for extreme ultraviolet radiation. The scheme is based on a binary profile operated in grazing incidence along the grating bars under total external reflection. It is shown that periods of a few 10(2) nm may permit an exclusive (±1)(st) order diffraction with efficiencies up to ~ 35% in each of them, whereas higher evanescent orders vanish. In contrast, destructive interference eliminates the 0(th) order. For a sample made of SiO(2) on silicon, measured data and simulated results from rigorous coupled wave analysis procedures are given.


Assuntos
Lasers , Modelos Teóricos , Óptica e Fotônica/instrumentação , Dióxido de Silício/química , Silício/química , Simulação por Computador , Desenho de Equipamento , Óptica e Fotônica/métodos
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