Development and evaluation of oral Cancer quality-of-life questionnaire (QOL-OC).

BACKGROUND: In this study scales and items for the Oral Cancer Quality-of-life Questionnaire (QOL-OC) were designed and the instrument was evaluated. METHODS: The QOL-OC was developed and modified using the international definition of quality of life (QOL) promulgated by the European Organization for Research and Treatment of Cancer (EORTC) and analysis of the precedent measuring instruments. The contents of each item were determined in the context of the specific characteristics of oral cancer. Two hundred thirteen oral cancer patients were asked to complete both the EORTC core quality of life questionnaire (EORTC QLC-C30) and the QOL-OC. Data collected was used to conduct factor analysis, test-retest reliability, internal consistency, and construct validity. RESULTS: Questionnaire compliance was relatively high. Fourteen of the 213 subjects accepted the same tests after 24 to 48 h demonstrating a high test-retest reliability for all five scales. Overall internal consistency surpasses 0.8. The outcome of the factor analysis coincides substantially with our theoretical conception. Each item shows a higher correlation coefficient within its own scale than the others which indicates high construct validity. CONCLUSIONS: QOL-OC demonstrates fairly good statistical reliability, validity, and feasibility. However, further tests and modification are needed to ensure its applicability to the quality-of-life assessment of Chinese oral cancer patients.

Polynomial fitting method of background correction for electron backscatter diffraction patterns.

A raw electron backscatter diffraction (EBSD) signal can be empirically decomposed into a Kikuchi diffraction pattern and a smooth background. For pattern indexing, the latter is generally undesirable but can reveal topographical, compositional, or diffraction contrast. In this study, we proposed a new background correction method using polynomial fitting (PF) algorithm to obtain clear Kikuchi diffraction patterns for some applications in nonconductive materials due to coating problems, at low accelerated voltage and at rough sample surfaces and for the requirement of high pattern quality in HR-EBSD. To evaluate the quality metrics of the Kikuchi patterns, we initially used three indices, namely, pattern quality, Tenengrad variance, and spatial-spectral entropy-based quality to detect the clarity, contrast, and noise of Kikuchi patterns obtained at 5 and 15 kV. Then, we examined the performance of PF method by comparing it with pattern averaging and Fourier transform-based methods. Finally, this PF background correction is demonstrated to extract the background images from the blurred diffraction patterns of EBSD measurements at low kV accelerating voltage and with coating layer, and to provide clear Kikuchi patterns successfully.