RESUMO
Model metal-semiconductor nanostructure Schottky nanocontacts were made on cleaved heterostructures containing GaAs quantum wells (QWs) of varying width and were locally probed by ballistic electron emission microscopy. The local Schottky barrier was found to increase by approximately 0.140 eV as the QW width was systematically decreased from 15 to 1 nm, due mostly to a large (approximately 0.200 eV) quantum-confinement increase to the QW conduction band. The measured barrier increase over the full 1 to 15 nm QW range was quantitatively explained when local "interface pinning" and image force lowering effects are also considered.
RESUMO
We show that depositing Si while annealing patterned Si(001)-(2 x 1) substrates at sublimation temperatures enhances terrace stability, permitting larger step-free areas to be produced in a given time than possible by annealing alone. We confirm this enhanced terrace stability using real-time low-energy electron microscopy observations, and quantitative microscopic modeling of step dynamics. Our measurements can be used to estimate the lateral variation in adatom concentration across large terraces, and to estimate an adatom diffusion length lambda approximately 10-30 microm at 1000 degrees C.
RESUMO
Threading dislocations (TDs) of molecular beam epitaxy grown GaN film were studied with ultrahigh vacuum ballistic electron emission microscopy in order to quantify any fixed negative charge at identifiable TDs, with approximately 3 nm spatial and approximately 10 meV local barrier resolution. In contrast to several prior studies, we find no indication of fixed negative dislocation charge at specific TD structures, with a conservative upper limit of approximately 0.25 e(-) per c-axis unit cell. We do observe evidence of positive surface charge at TDs and at GaN step edges, which may be due to local piezoelectric fields.